Method for measuring orthogonality in a stage of an exposure app

Details Method for measuring orthogonality in a stage of an exposure app Method for measuring orthogonality in a stage of an exposure app

1996-11-20

1999-11-30

Turner, Samuel A.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356363, G01B 902

Patent

active

059952253

ABSTRACT:
A projection exposure apparatus has a function to measure orthogonality between movement mirrors for interferometers for measuring positions of a substrate table in X and Y directions. The substrate table is moved by a distance L along a direction of a third axis which is included in an XY plane and inclined at an angle .alpha. with respect to a Y axis, while operating a movement mirror and an interferometer for the direction of the third axis. A component in the Y direction corresponding to the distance L in the direction of the third axis is defined as d. A movement distance of the substrate table in the X direction after movement of the substrate table by the distance L in the direction of the third axis is determined by the interferometer for measuring the position in the X direction, which is defined as S. An orthogonality error .theta. can be determined in accordance with .theta.=tan.sup.-1 [(d-S)/d]. The position of the substrate table can be correctly controlled by moving the substrate table while giving an offset to correct the error. This function can be also applied to a mask stage.

REFERENCES:
patent: 4311390 (1982-01-01), Phillips
patent: 4676649 (1987-06-01), Phillips
patent: 4742286 (1988-05-01), Phillips
patent: 5440397 (1995-08-01), Ono et al.
patent: 5523843 (1996-06-01), Yamane et al.
patent: 5532822 (1996-07-01), Shinozaki et al.

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