Method for measuring optical strain and apparatus therefor

Optics: measuring and testing – Material strain analysis – With polarized light

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

356 32, G01B 1118

Patent

active

047814551

ABSTRACT:
A method and an apparatus for optical strain measurement are disclosed. Prior to the deformation or loading of the object to be tested, the latter is provided with a thin transparent film which adheres well to the object and has a thickness between 3 and 20 .mu.m. After the deformation or during loading, the wavelength-dependent intensity course developed because of the interference of the portion of the beam of light reflected and superimposed at the boundary surfaces of the transparent film is measured and evaluated by a computer.

REFERENCES:
patent: 3082664 (1963-03-01), Acloque
patent: 3623813 (1971-11-01), Hacman
patent: 3824017 (1974-07-01), Galyon
patent: 4493995 (1985-01-01), Adolfsson et al.
patent: 4498772 (1985-02-01), Jastrzebski et al.
"Holographic Method Giving Stress Levels and Visualization of Defects in Thick Cylinders".

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for measuring optical strain and apparatus therefor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for measuring optical strain and apparatus therefor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for measuring optical strain and apparatus therefor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-887113

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.