Photocopying – Projection printing and copying cameras – With temperature or foreign particle control
Reexamination Certificate
2011-04-12
2011-04-12
Nguyen, Hung Henry (Department: 2882)
Photocopying
Projection printing and copying cameras
With temperature or foreign particle control
C355S053000
Reexamination Certificate
active
07924400
ABSTRACT:
A method for measuring a liquid immersion lithography soluble fraction in an organic film including a mounting step of mounting a droplet of a liquid immersion medium for liquid immersion lithography on a surface of an organic film formed on a substrate; and a transfer step of transferring a component in the organic film into the droplet.
REFERENCES:
patent: 4990459 (1991-02-01), Maeda et al.
patent: 5055413 (1991-10-01), Kageyama et al.
patent: 5426057 (1995-06-01), Tamaoki
patent: 5610683 (1997-03-01), Takahashi
patent: 7317507 (2008-01-01), Straaijer
patent: 7399635 (2008-07-01), Hellin et al.
patent: H02-028533 (1990-01-01), None
patent: H10-303114 (1998-11-01), None
patent: 2944099 (1999-08-01), None
patent: H11-218474 (1999-08-01), None
patent: 2005-079238 (2005-03-01), None
patent: 2005-101498 (2005-04-01), None
patent: 2005-135949 (2005-05-01), None
patent: 2005-157259 (2005-06-01), None
patent: WO-2004/074937 (2004-09-01), None
Omori, Katsumi et al., “New Cover Material Development Status for Immersion Lithography”, Oct. 28, 2004, Anti-Reflective Coatings Symposium 2004.
Taiwan Patent Application No. 095135286, Office Action, mailed Feb. 17, 2009.
Kohda Nobuyuki
Tsuji Hiromitsu
Yajima Takayuki
Yoshida Masaaki
Beuerle Stephen C.
Nguyen Hung Henry
Procopio Cory Hargreaves & Savitch LLP
Tokyo Ohka Kogyo Co. Ltd.
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