Method for measuring dimensions of fine pattern

Details Method for measuring dimensions of fine pattern Method for measuring dimensions of fine pattern

1987-03-09

1988-12-06

Boudreau, Leo H.

Image analysis

Histogram processing

For setting a threshold

382 25, G06K 946

Patent

active

047900237

ABSTRACT:
A method for measuring the dimensions of a fine pattern, comprises first measuring a surface area and determining a profile of a displayed pattern image, second, calculating the center of gravity of the pattern image, third, calculating an equivalent diameter of a circular pattern having the same surface area as the pattern image, fourth, calculating a mean value of pattern lengths of lines which all pass through the center of gravity of the pattern image and which intersect the pattern image at two intersecting points; and fifth, comparing the mean value with the equivalent diameter of the circular pattern image. The pattern lengths are defined as distances between the two intersecting points.

REFERENCES:
patent: 4017721 (1977-04-01), Michaud
patent: 4360274 (1982-11-01), Norton-Wayne
patent: 4596037 (1986-06-01), Bouchard et al.
patent: 4627096 (1986-12-01), Grattoni et al.
patent: 4644583 (1987-02-01), Watanabe et al.
patent: 4658428 (1987-04-01), Bedros et al.
patent: 4677473 (1987-06-01), Okamoto et al.

Affiliated with

Also associated with

Rating

Method for measuring dimensions of fine pattern does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for measuring dimensions of fine pattern, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for measuring dimensions of fine pattern will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1497801