Method for measuring contact resistance

Details Method for measuring contact resistance Method for measuring contact resistance

1993-04-16

1994-11-15

Regan, Maura K.

Electricity: measuring and testing

Impedance, admittance or other quantities representative of...

Lumped type parameters

324713, 3241581, G01R 3126

Patent

active

053651804

ABSTRACT:
An improved method for measuring contact resistance during device testing is disclosed. After a device under text has been properly positioned to make a contact with a test fixture, a first test current is forced between two pins of the device under test through an isolating diode and the voltage drop associated therewith is measured. Then, a second test current is forced to take the same path and the voltage drop associated therewith is also measured. The values of the forced currents and the measured voltage drops are then used to determine the dynamic resistance of the path, which includes the resistance of two contacts. The determined dynamic resistance or a derivative thereof is then used as an indication of the contact resistance between the test fixture and the device under test.

REFERENCES:
patent: 3996514 (1976-12-01), Brown et al.
patent: 4175253 (1979-11-01), Pitegoff
patent: 4336496 (1982-06-01), Schnabl et al.
patent: 5239270 (1993-08-01), Desbiens

Affiliated with

Also associated with

Rating

Method for measuring contact resistance does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for measuring contact resistance, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for measuring contact resistance will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1100238