Method for measuring and controlling the oxygen concentration in

Details Method for measuring and controlling the oxygen concentration in Method for measuring and controlling the oxygen concentration in

1995-08-07

1998-03-03

Ludlow, Jan

Chemistry: analytical and immunological testing

Condition responsive control

73DIG9, 117 15, 117202, 422 62, 436 75, 436138, G01N 3320, G01N 2726, G01N 27411

Patent

active

057233373

ABSTRACT:
A method for measuring and controlling the oxygen concentration in silicon melts which are contained in a silica glass crucible or which can be touched by a silica glass surface can especially be used for achieving a defined, uniform axial and radial oxygen concentration in a growing silicon crystal. The measurement of the oxygen concentration is realized by an electrochemical solid ionic sensor dipped into the melt; the voltage is measured between the sensor and the growing silicon crystal. The oxygen concentration in the melt is controlled by applying a voltage between crystal and silica glass crucible. The apparatus for putting the method into practice includes an electrochemical solid ionic sensor formed of a silica glass tube which encloses a metal/metal oxide mixture, contacted by a metal wire.

REFERENCES:
patent: 4007106 (1977-02-01), Hone et al.
patent: 4330359 (1982-05-01), Shlichta
patent: 4400232 (1983-08-01), Ownby et al.
patent: 4496424 (1985-01-01), Terashima et al.
patent: 5041186 (1991-08-01), Nishio et al.
Willard et al. Instrumetal Methods of Analysis Sixth Edition, Wadsworth Publishing (Belmont CA) 1981, pp. 640-645.

Affiliated with

Also associated with

Rating

Method for measuring and controlling the oxygen concentration in does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for measuring and controlling the oxygen concentration in, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for measuring and controlling the oxygen concentration in will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2246791