Method for measuring amount of bend of moving mirror

Optics: measuring and testing – By polarized light examination – With light attenuation

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Details

356377, 356371, 356394, G01B 1124

Patent

active

056381794

ABSTRACT:
Test reticle patterns (reticle pattern images) are transferred by exposure onto an unexposed wafer in a plurality of rows parallel to a predetermined direction, and a rotation angle of each reticle pattern image is obtained from an amount of positional displacement in the vertical direction (direction Y) (Steps 102 to 104). A rotation angle of each reticle pattern image is obtained from the bend of a moving mirror within an exposure range on a wafer stage which is obtained by correcting an amount of positional displacement in a horizontal direction (direction X) by the rotation angle obtained from the positional displacement in the vertical direction and the bend of the moving mirror assumed in a region outside the exposure range, and a residual rotation error between the thus obtained rotation angle and the actual rotation angle is obtained (Steps 105 to 107). An amount of bend of the moving mirror in the region outside the exposure range is obtained from the residual rotation error (Steps 108 and 109), thereby accurately measuring an amount of bend of the moving mirror in a region which is outside the exposure range and which is illuminated with a light beam from an interferometer for rotation error measurement.

REFERENCES:
patent: 5151749 (1992-09-01), Tanimoto et al.
patent: 5151750 (1992-09-01), Magome et al.
patent: 5473435 (1995-12-01), Masuyuki et al.

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