Image analysis – Image transformation or preprocessing – Changing the image coordinates
Reexamination Certificate
2005-03-29
2005-03-29
Couso, Yon J. (Department: 2625)
Image analysis
Image transformation or preprocessing
Changing the image coordinates
C382S276000
Reexamination Certificate
active
06873747
ABSTRACT:
In accordance with an embodiment of the invention, a method for measuring pitch in data obtained from metrology and imaging systems is provided. A data set from a metrology or imaging instrument is obtained. The data set is converted into digital format if not already in that format. The digitized data set is mapped into a one-dimensional profile data if the digitized data set is not already one-dimensional. The one-dimensional profile data denoted by f(x) is a function of x position values corresponding to equally spaced or nearly equally spaced pixels. A criteria function g(T) is constructed as a one-dimensional data array from the profile data f(x) or any of its derivatives and a translation of the profile data f(x) denote by f(x+T) or any of its derivatives. Here, T represents the amount of translation, and g(T) is a function of T translation values corresponding to equally spaced or nearly equally spaced pixels. A value of translation T is then determined either as a whole pixel or with subpixel interpolation such that the magnitude of g(T) would be either a maximum or a minimum whichever appropriate at said value, wherein the determined value is not zero. The determined value is then reported as the pitch in the data set.
REFERENCES:
patent: 4818873 (1989-04-01), Herriot
patent: 5644512 (1997-07-01), Chernoff et al.
patent: 6384408 (2002-05-01), Yee et al.
patent: 6570157 (2003-05-01), Singh et al.
patent: 6653634 (2003-11-01), Otaka et al.
patent: 6661007 (2003-12-01), Sicignano et al.
Ronald Dixson et al, National Institute of Standards and Technology, “Dimensional Metrology with the NIST Calibrated Atomic Force Microscope”, Proceedings of SPIE, vol. 3677, pp. 20-34, 1999.
S.R. Dooley et al, “Comparison of discrete subsample time delay estimation methods applied to narrowband signals”, Measurement Science and Technology, vol. 9, pp. 1400-1408, 1998.
Scott C. Douglas, “A Frequency Domain Subpixel Position Estimation Algorithm for Overlay Measurement”, Proceedings of SPIE, vol. 1926, pp. 402-405, 1993.
D. M. Holburn et al, “A Pattern Recognition Technique Using Sequence of Marks for Registration in Electron Beam Lithography”, Journal of Vacuum Science and Technology, vol. 19(4), pp. 1229-1233, 1981.
Fumio Mizuno et al, “Evaluation of the long-term stability of critical-dimension measurement scanning electron microscopes using a calibration standard”, Journal of Vacuum Science and Technology B, vol. 15(6), pp. 2177-2190, 1997.
Anatoly Shchemelinin et al, “Basic Challenges of Optical Overlay Measurement”, Proceedings of SPIE, vol. 3050, pp. 425-431, 1997.
J.S. Villarubia et al, National Institute of Standards and Technology, “Intercomparison of SEM, AFM, and Electrical Linewidths”, Proceedings of SPIE, vol. 3677, pp. 587-597, 1999.
Alexander I. Zaslavsky, “Overlay Measurement and Edge Detection Methods”, Proceedings of SPIE, vol. 3050, pp. 418-424, 1997.
N. F. Zhang et al, National Institute of Standards and Technology, “A New Algorithm for the Measurement of Pitch in Metrology Instruments”, Proceedings of SPIE, vol. 2725, pp. 147-158, 1996.
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