Method for master pattern production

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430 23, 430 24, 430321, G03C 500, G03C 506

Patent

active

042489474

ABSTRACT:
A method for producing a master pattern used for manufacture of a color picture tube phosphor screen is disclosed. An image of an interchangeable shadow mask is formed on the internal surface of the face glass and transferred onto a photosensitive plate, thereby producing a master pattern with a very high accuracy. In the case of a very thin photosensitive plate, the master pattern is produced directly from the interchangeable shadow mask. The method for producing a color picture tube by use of a master pattern involves equipment much lower in cost and easier in manufacturing processes than the conventional methods due to the facts that exposure by flood light is possible and that the shadow mask and the face glass need not be handled as a couple.

REFERENCES:
patent: 3558310 (1971-01-01), Mayaud
patent: 3615461 (1971-10-01), Kaplan
patent: 3615461 (1971-10-01), Kaplan
patent: 3615462 (1971-10-01), Szecho et al.
patent: 3676914 (1972-07-01), Fiore
patent: 3698903 (1972-10-01), Dodd et al.
patent: 3900359 (1975-08-01), Bakewell
patent: 3973964 (1976-08-01), Lange
patent: 3975198 (1976-08-01), Palac et al.
patent: 3989524 (1976-11-01), Palac

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for master pattern production does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for master pattern production, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for master pattern production will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-551402

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.