Method for maskless lithography

Details Method for maskless lithography Method for maskless lithography

1999-01-14

2000-05-09

Gibson, Sharon

Radiation imagery chemistry: process, composition, or product th

Using reflected radiation, e.g., reflex copying, etc.

430311, 430396, 359223, 2504922, G03C 510

Patent

active

060602244

ABSTRACT:
The present invention provides a method for maskless lithography. A plurality of individually addressable and rotatable micromirrors together comprise a two-dimensional array of micromirrors. Each micromirror in the two-dimensional array can be envisioned as an individually addressable element in the picture that comprises the circuit pattern desired. As each micromirror is addressed it rotates so as to reflect light from a light source onto a portion of the photoresist coated wafer thereby forming a pixel within the circuit pattern. By electronically addressing a two-dimensional array of these micromirrors in the proper sequence a circuit pattern that is comprised of these individual pixels can be constructed on a microchip. The reflecting surface of the micromirror is configured in such a way as to overcome coherence and diffraction effects in order to produce circuit elements having straight sides.

REFERENCES:
patent: 4793699 (1988-12-01), Tokuhara
patent: 5539567 (1996-07-01), Lin et al.
patent: 5539568 (1996-07-01), Lin et al.
patent: 5631782 (1997-05-01), Smith et al.
patent: 5691541 (1997-11-01), Ceglio et al.
patent: 5796508 (1998-08-01), Suzuki
patent: 5877844 (1999-03-01), Matsumoto

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