Chemistry: electrical and wave energy – Processes and products – Electrophoresis or electro-osmosis processes and electrolyte...
Patent
1995-09-26
1997-12-23
Gorgos, Kathryn L.
Chemistry: electrical and wave energy
Processes and products
Electrophoresis or electro-osmosis processes and electrolyte...
204490, 204472, C25D 1302
Patent
active
057003610
ABSTRACT:
A method for manufacturing a thin zirconia film comprises the steps: (a) preparing a suspension in which partially-stabilized or stabilized zirconia particles having electric charges are dispersed in a solvent; (b) positioning a pair of electrodes in the suspension; (c) applying an electric field between the electrodes, said zirconia particles moving to the electrode and said zirconia particles being deposited on the electrode electrochemically; and (d) sintering the zirconia film to form a partially-stabilized or stabilized thin zirconia film.
REFERENCES:
patent: 3860506 (1975-01-01), Nickerson
patent: 4276202 (1981-06-01), Schmidberger et al.
patent: 4609562 (1986-09-01), Isenberg et al.
patent: 4975417 (1990-12-01), Koura
patent: 5002647 (1991-03-01), Tanabe et al.
patent: 5021376 (1991-06-01), Nienburg et al.
Patent Abstracts of Japan, vol. 012, No. 277 (E-640), 30 Jul. 1988 of JP-A-63 058766 (Toa Nenryo Kogyo KK), 14 Mar. 1988.
Ishihara Tatsumi
Manabe Yasuhiko
Ogawa Takashi
Shiomitsu Tohru
Takita Yusaku
Gorgos Kathryn L.
Mayekar Kishor
NKK Corporation
Takita Yusaku
LandOfFree
Method for manufacturing thin zirconia film does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for manufacturing thin zirconia film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for manufacturing thin zirconia film will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1799681