Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k
Patent
1991-08-21
1992-09-08
Beck, Shrive
Superconductor technology: apparatus, material, process
High temperature , per se
Having tc greater than or equal to 150 k
505701, 505702, 505727, 427 36, 427 38, 427 62, 427 63, 357 5, 365161, 365162, B05D 306, B05D 512
Patent
active
051458306
ABSTRACT:
A manufacturing method for the thin film superconductor is disclosed in which photons having energies larger than ultraviolet rays are irradiated to the thin film superconductor on or after formation of the thin film. Further, manufacturing methods for superconductive magnetic memory, Josephson device and superconductive transistor are disclosed.
REFERENCES:
"Ozone-UV Irradiation Effects On Ba.sub.2 YCu.sub.3 O.sub.7-x Thin Films", H. Tamura et al., Appl. Phys. Lett. vol. 52, No. 25, Jun. 20, 1988, pp. 2183-2185.
"Laser-Induced Formation and Surface Processing of High-Temperature Superconductors" D. Bauerle, Applied Physics A 48 (6) 527-542, (1989).
"X-Ray Irradiation Enhanced Critical Current Density and Strong Pinning Sites Created in Gd.sub.1 Ba.sub.2 Cu.sub.3 O.sub.7-x Thin Films", S. Kohiki et al., Appl. Phys. A. 50, 509-514 (1990).
Enokihara Akira
Hatta Shin-ichiro
Hayashi Shigenori
Higashino Hidetaka
Kamada Takeshi
Beck Shrive
King Roy V.
Matsushita Electric - Industrial Co., Ltd.
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