Etching a substrate: processes – Forming or treating article containing magnetically...
Patent
1995-09-07
1997-12-23
Powell, William
Etching a substrate: processes
Forming or treating article containing magnetically...
216 41, B44C 122
Patent
active
057003815
ABSTRACT:
After applying a metal film on a surface of a substrate, the metal film is patterned in such a manner that the surface of the substrate is exposed in a pattern that corresponds to the pattern of the required indented portion. Then, the substrate is immersed in an etchant which etches the substrate selectively to form the indented portion in the surface of the substrate using the metal film as a mask.
The method makes it possible to define the depth and the pattern of an indented portion where a magnetic transducer is provided with a high degree of accuracy, to prevent a reduction in pattern accuracy due to re-adhering and to advance industrial productivity.
REFERENCES:
patent: 4878290 (1989-11-01), Masud et al.
patent: 5326429 (1994-07-01), Cohen et al.
Abe Takashi
Dobashi Akihiko
Kimura Fujimi
Tanaka Toyoaki
Powell William
TDK Corporation
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