Method for manufacturing thin Fe--Ni alloy sheet for shadow mask

Metal treatment – Process of modifying or maintaining internal physical... – Heating or cooling of solid metal

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148624, 148651, C21D 802

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active

055207553

ABSTRACT:
A thin Fe--Ni alloy sheet for shadow mask consists essentially of Ni of 34 to 38 wt. %, Si of 0.05 wt. % or less, B of 0.0005 wt. % or less, O of 0.002 wt. % or less and N of 0.0015% or less, the balance being Fe and inevitable impurities; said alloy sheet after annealing before press-forming having 0.2% proof stress of 28.5 kgf/mm.sup.2 or less; and a degree of {211} plane on a surface of said alloy sheet being 16% or less. And further modified similar alloy sheets are also provided.
Further, a method for producing a thin Fe--Ni alloy sheet for shadow mask comprises the steps of: (a) hot-rolling of a slab into a hot-rolled alloy strip; (b) hot-rolled sheet annealing of the hot-rolled strip at 910.degree. to 990.degree. C.; (c) cold-rolling of the annealed hot-rolled strip into a cold-rolled strip; (d) recrystallization annealing of the cold-rolled strip; (e) finish cold-rolling of the recrystallization annealed strip at a finish cold reduction ratio in response to austenite grain size D(D.mu.m) yielded by the recrystallization annealing, the finish cold reducration ratio(R) being within a region enclosed by a range of R of 16 to 75 and a range of D of 6.38D-133.9.ltoreq.R.ltoreq.6.38D-51.0 and (f) annealing of the finish cold-rolled strip on conditions of a temperature of 720.degree. to 790.degree. C., a time of 2 to 40 min. and T.gtoreq.-53.8 logt+806, where T(.degree.C.) is the temperature of the annealing. And further modified similar methods are also provided.

REFERENCES:
patent: 4724012 (1988-02-01), Inaba et al.
patent: 4751424 (1988-06-01), Tong
patent: 5127965 (1992-07-01), Inoue et al.
patent: 5158624 (1992-10-01), Okiyama et al.
patent: 5207844 (1993-05-01), Watanabe et al.
patent: 5234512 (1993-08-01), Inoue et al.
patent: 5234513 (1993-08-01), Inoue et al.
patent: 5308723 (1994-05-01), Inoue et al.
Chemical Abstracts, p. 249, No. 133956d of JP-A-60 251 227, vol. 104, No. 16, Apr. 21, 1986.
Database WPIL, week 8732, Derwent Publications Ltd., London, GB; AN 87-224995; abstract of JP-A-62 149 851 (1987).
Database WPIL, Week 8615, Derwent Publications Ltd., London, GB; AN 86-098295; abstract of JP-A-61 044 126 (1986).
Database WPIL, Week 8610, Derwent Publications Ltd., London, GB; AN 86-066609; abstract of JP-A-61 019 737 (1986).
Patent Abstracts Of Japan, vol. 10, No. 296 (C-377), Oct. 8, 1986 of JP 61-113747 (Nippon Mining Co., Ltd.), May 31, 1986.
Patent Abstracts Of Japan, vol. 15, No. 461 (C-0887), Nov. 22, 1991 OF JP 3-197645 (Nippon Mining Co., Ltd.), Aug. 29, 1991.
Patent Abstracts Of Japan, vol. 13, No. 69 (C-569), Feb. 16, 1989 of JP 63-259054 (Nippon Mining Co., Ltd.), Oct. 26, 1988.
Patent Abstracts Of Japan, vol. 15, No. 461 (C-0887), Nov. 22, 1991 of JP 3-197646 (Nippon Mining Co., Ltd.), Aug. 29, 1991.
Patent Abstracts Of Japan, vol. 15, No. 92 (C-0811), Mar. 6, 1991 of JP 2-305941 (Toyo Kohan Co., Ltd.), Dec. 19, 1990.
Patent Abstracts Of Japan, vol. 10, No. 196 (C-377), Oct. 8, 1986 of JP 61-113746 (Nippon Mining Co., Ltd.), May 31, 1986.

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