Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2005-02-15
2005-02-15
Nhu, David (Department: 2818)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S745000
Reexamination Certificate
active
06855637
ABSTRACT:
Provided is a method of manufacturing surface acoustic wave (SAW) devices having a first conductive pattern and a second conductive pattern of different thicknesses on one piezoelectric substrate. Combination of a plurality of steps of forming metal films and etching steps allows accurate production of SAW devices having a plurality of electrodes of different thicknesses on one piezoelectric substrate.
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Furukawa Mitsuhiro
Ikeda Kazuo
Seki Shun-ichi
Yamashita Kiyoharu
Nhu David
Parkhurst & Wendel L.L.P.
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