Superconductor technology: apparatus – material – process – Processes of producing or treating high temperature... – With material removal by etching – laser ablation – or...
Patent
1994-02-18
1995-10-31
Powell, William
Superconductor technology: apparatus, material, process
Processes of producing or treating high temperature...
With material removal by etching, laser ablation, or...
505329, 505820, 437910, 216 3, 216101, 216100, B05D 500, B44C 122
Patent
active
054629195
ABSTRACT:
For manufacturing a superconducting thin film having at least one non-superconducting region at and near its surface portion, an oxide superconductor thin film is formed on a surface of the substrate. The oxide superconductor thin film is heated in high vacuum environment so that oxygen of the oxide superconductor crystals escapes from the surface of the oxide superconductor thin film and a surface portion of the oxide superconductor thin film having a substantial thickness changes into non-superconducting layer of a compound oxide which is composed of the same constituent elements as those of the oxide superconductor but includes the oxygen amount less than that of the oxide superconductor and a thin superconducting channel is formed under the non-superconducting layer. A portion of the non-superconducting layer, which will become the non-superconducting region is selectively masked, and heated in an oxidation atmosphere so that oxygen penetrates into the non-superconductor layer from exposed surface and the compound oxide of the exposed portion of the non-superconductor layer changes into the oxide superconductor which is electrically connected to the superconducting channel.
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Iiyama Michitomo
Tanaka So
Powell William
Sumitomo Electric Industries,Ltd.
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