Chemistry of inorganic compounds – Sulfur or compound thereof – Oxygen containing
Patent
1996-04-01
1998-05-19
Straub, Gary P.
Chemistry of inorganic compounds
Sulfur or compound thereof
Oxygen containing
423529, 423532, 4232421, C01B 1774
Patent
active
057532010
ABSTRACT:
A method for manufacturing sulfuric acid from a gas containing sulfur oxides, water and oxygen comprising subjecting the sulfur oxides rich gas to either an adiabatic compressor or a flame impinger to rapidly increase the temperature so that the sulfur dioxide in the gas is converted into sulfur trioxide and cooling the sulfur trioxide rich gas to produce sulfuric acid.
REFERENCES:
patent: 1125208 (1915-01-01), Summers
patent: 3043662 (1962-07-01), Lipscomb
patent: 3349029 (1967-10-01), Cheng
patent: 3350170 (1967-10-01), Finneran et al.
patent: 3568403 (1971-03-01), Richardson
patent: 3592592 (1971-07-01), Schmidt
patent: 3647360 (1972-03-01), Jaeger
patent: 4727237 (1988-02-01), Schantz
patent: 4780305 (1988-10-01), Steppe
patent: 5061463 (1991-10-01), Vickery
patent: 5084258 (1992-01-01), Lin
patent: 5538707 (1996-07-01), McAlister
"Handbook of Chemistry and Physics" Edited by Hodgman et al., Published by The Chemical Rubber Pub. Co, Cleveland Ohio U.S.A., 43rd Edition, Apr. 1962, pp. 664-665.
"The Manufacture of Sulfuric Acid" edited by Duecker et al., Krieger Publishing Co. Huntington N.Y.; no month 1959; pp. 240-245 and 278-284.
"Chemical Engineer's Handbook" by Perry et al.; pp. 9-15 to 9-19 and also pp. 9-32; 5th ed., McGraw-Hill Book Co. (no month 1973).
U.S. Statutory invention Registration No. H1189 by Kirts published May 1993 .
Straub Gary P.
Vanoy Timothy C.
LandOfFree
Method for manufacturing sulfuric acid does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for manufacturing sulfuric acid, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for manufacturing sulfuric acid will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1850123