Method for manufacturing substrate of liquid crystal device

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element

Reexamination Certificate

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Details

C438S161000, C257SE29290, C257SE33065, C257SE21431, C257SE21432

Reexamination Certificate

active

07544528

ABSTRACT:
A method for manufacturing a substrate of a liquid crystal display device is disclosed. The method includes forming a conductive line structure with low resistance to improve the difficulty of the resistance matching. The method can effectively reduce the resistance of the conductive line of the LCD panel to increase the transmission rate of the driving signal. Hence, the increasing yield of products can reduce the cost of manufacturing, and can meet the requirement of the large-size and high-definition thin film transistor liquid crystal display device.

REFERENCES:
patent: 2002/0182785 (2002-12-01), Miyairi
patent: 2008/0001232 (2008-01-01), Lee et al.
patent: 1388406 (2003-01-01), None
patent: 1832220 (2006-09-01), None
patent: 5029346 (1993-02-01), None
patent: 6163586 (1994-06-01), None
patent: 9260668 (1997-10-01), None
patent: 2005210081 (2005-08-01), None
patent: 10-2004-0061450 (2004-07-01), None

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