Metal working – Barrier layer or semiconductor device making – Barrier layer device making
Reexamination Certificate
2011-08-02
2011-08-02
Ghyka, Alexander (Department: 2812)
Metal working
Barrier layer or semiconductor device making
Barrier layer device making
Reexamination Certificate
active
07988743
ABSTRACT:
Disclosed is a method for manufacturing a solid electrolytic capacitor in which a capacitor element has conductive polymer solid electrolyte on a dielectric oxide film layer. The method includes the following processes: forming a manganese oxide layer on the dielectric oxide film layer; and chemically polymerizing a reaction solution containing a monomer, aromatic sulfonic acid, and a solvent using the manganese oxide layer as an oxidizing agent. Here, polyhydric alcohol capable of being coordinated to manganese ions released from the manganese oxide layer is made to coexist with the chemical polymerization reaction.
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patent: 7826200 (2010-11-01), Pascenko
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patent: 2001-110683 (2001-04-01), None
Kochi Ayumi
Shimamoto Yukari
Takagi Seiji
Tsuji Yasunobu
Ghyka Alexander
Nikmanesh Seahvosh
Panasonic Corporation
Pearne & Gordon LLP
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