Method for manufacturing semiconductor device having step of for

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437186, 437187, H01L 2160

Patent

active

058437983

ABSTRACT:
An electrode-pin forming mask is used to form electrode pins on the semiconductor chip. The electrode-pin forming mask has electrode-pin forming holes matching electrode pads previously formed on the semiconductor chip. A screen-printing technique is used to form the electrode pins on the semiconductor chip through the electrode-pin forming mask. That is, conductive material in a paste state is pushed into the electrode-pin forming holes in a condition where the electrode-pin forming mask has been placed on the semiconductor chip and positions of the electrode-pin forming holes match positions of the electrode pads of the semiconductor chip, respectively. The conductor material thus pushed into the electrode-pin forming holes is thus shaped as to form the electrode pins projecting from the electrode pads of the semiconductor chip. Then, the electrode-pin forming mask is removed from the semiconductor chip while the thus shaped conductor material continues to be projected from the electrode pads of the semiconductor chip. Thus, the electrode pins are formed on the semiconductor chip.

REFERENCES:
patent: 4712721 (1987-12-01), Noel et al.
patent: 4724472 (1988-02-01), Sugimoto et al.
patent: 5149671 (1992-09-01), Koh et al.
patent: 5191708 (1993-03-01), Kasukabe et al.
patent: 5246880 (1993-09-01), Reele et al.
patent: 5468681 (1995-11-01), Pasch
patent: 5513430 (1996-05-01), Yanof et al.
patent: 5547530 (1996-08-01), MaKamura et al.
patent: 5607877 (1997-03-01), Matsuda et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for manufacturing semiconductor device having step of for does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for manufacturing semiconductor device having step of for, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for manufacturing semiconductor device having step of for will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2395223

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.