Semiconductor device manufacturing: process – Making passive device – Stacked capacitor
Patent
1998-07-17
2000-11-07
Nelms, David
Semiconductor device manufacturing: process
Making passive device
Stacked capacitor
438397, 438210, 438239, 438542, 438255, 117103, 117 97, 117 98, 117105, H01L 2120
Patent
active
061436194
ABSTRACT:
A method of manufacturing a semiconductor device contains a first treatment step of removing a silicon oxide film on a semiconductor substrate (15) in a rare hydrofluoric acid treatment device (12), a second treatment step of forming hemispherical grained silicon on the semiconductor substrate (15) in an HSG-Si forming device (13), and a step of moving the semiconductor substrate (15) treated in the first treatment step to the HSG-Si forming device (13) by means of a semiconductor substrate moving device (14), wherein filtering an air in the semiconductor substrate moving device (14) is conducted so that an amount of organic materials which adhere onto a surface of the semiconductor substrate (15) during a process to the second treatment step is set to 1 ng/cm.sup.2 or less.
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Fujiwara Shuji
Katuyama Takao
Okamura Kenji
Hoang Quoc
NEC Corporation
Nelms David
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