Method for manufacturing semiconductor device

Semiconductor device manufacturing: process – Having organic semiconductive component

Reexamination Certificate

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Details

C438S404000, C438S685000, C257SE51024, C257S021000

Reexamination Certificate

active

07838328

ABSTRACT:
A method for manufacturing a semiconductor device having flexibility by separating an element that is manufactured by a comparatively low-temperature (temperature of less than 500° C.) process from a substrate is provided. The element is separated from a glass substrate by the following steps: forming a silicone layer over a glass substrate; performing plasma treatment to the surface of the silicone layer to weaken the surface of the silicone layer; stacking an organic compound layer over the silicone layer; and forming an element that is manufactured through a process at a comparatively low-temperature, typically, a temperature that the organic compound can withstand, over the compound layer.

REFERENCES:
patent: 5757456 (1998-05-01), Yamazaki et al.
patent: 5821138 (1998-10-01), Yamazaki et al.
patent: 6118502 (2000-09-01), Yamazaki et al.
patent: 6376333 (2002-04-01), Yamazaki et al.
patent: 6489659 (2002-12-01), Chakrabarti et al.
patent: 6998282 (2006-02-01), Yamazaki et al.
patent: 7050138 (2006-05-01), Yamazaki et al.
patent: 7361519 (2008-04-01), Yamazaki et al.
patent: 7375782 (2008-05-01), Yamazaki et al.
patent: 2001/0055854 (2001-12-01), Nishida et al.
patent: 2003/0032210 (2003-02-01), Takayama et al.
patent: 2003/0071953 (2003-04-01), Yamazaki et al.
patent: 2005/0070038 (2005-03-01), Yamazaki et al.
patent: 2006/0079039 (2006-04-01), Ohtani et al.
patent: 2007/0259585 (2007-11-01), Yamazaki et al.
patent: 2008/0073746 (2008-03-01), Tanaka
patent: 2008/0227232 (2008-09-01), Yamazaki et al.
patent: 2009/0004772 (2009-01-01), Jinbo et al.
patent: 08-250745 (1996-09-01), None
patent: 08-288522 (1996-11-01), None
patent: 2003-174153 (2003-06-01), None

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