Method for manufacturing semiconductor device

Semiconductor device manufacturing: process – With measuring or testing

Reexamination Certificate

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Details

C438S005000, C438S010000, C438S017000

Reexamination Certificate

active

07129099

ABSTRACT:
A manufacturing method for a semiconductor device which is capable of manufacturing the semiconductor device with a high quality in high yields while reducing variations in electric characteristic is disclosed. The manufacturing method according to the present invention includes a main body wafer manufacturing process for manufacturing a wafer on which a semiconductor device to be completed as a product is formed and a monitor wafer manufacturing process for manufacturing a wafer on which a monitor element is formed, the processes sharing a monitoring step alone, the main body wafer manufacturing process including a variation reduction step, the monitor wafer manufacturing process including a quality check step and a condition setting step.

REFERENCES:
patent: 5399229 (1995-03-01), Stefani et al.
patent: 5943552 (1999-08-01), Koveshnikov et al.
patent: 6511889 (2003-01-01), Takiguchi
patent: 6861268 (2005-03-01), Iwabuchi
patent: 6950716 (2005-09-01), Ward et al.
patent: 2002/0155630 (2002-10-01), Iwabuchi
patent: 5-347295 (1993-12-01), None

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