Etching a substrate: processes – Etching to produce porous or perforated article
Reexamination Certificate
2009-01-16
2011-10-25
Alanko, Anita (Department: 1713)
Etching a substrate: processes
Etching to produce porous or perforated article
C216S013000, C977S900000
Reexamination Certificate
active
08043520
ABSTRACT:
A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc−No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.
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Akasaka Yoshihiro
Asakawa Koji
Hiraoka Toshiro
Hotta Yasuyuki
Alanko Anita
Kabushiki Kaisha Toshiba
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
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