Etching a substrate: processes – Etching to produce porous or perforated article
Reexamination Certificate
2006-08-29
2006-08-29
Alanko, Anita (Department: 1765)
Etching a substrate: processes
Etching to produce porous or perforated article
C216S062000, C521S061000, C264S340000, C430S320000
Reexamination Certificate
active
07097781
ABSTRACT:
A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc−No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.
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Akasaka Yoshihiro
Asakawa Koji
Hiraoka Toshiro
Hotta Yasuyuki
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