Method for manufacturing pixel structure

Details Method for manufacturing pixel structure Method for manufacturing pixel structure

2009-06-03

2010-10-05

Qi, Mike (Department: 2871)

Liquid crystal cells, elements and systems

Particular excitation of liquid crystal

Electrical excitation of liquid crystal

C349S143000

Reexamination Certificate

active

07808569

ABSTRACT:
A method for manufacturing a pixel structure includes forming a first conductive layer on a substrate and patterning the first conductive layer with use of a first mask as an etching mask to form a gate. A dielectric layer is formed over the substrate to cover the gate. A semiconductor material layer is formed on the dielectric layer and patterned with use of the first mask as an etching mask to form a semiconductor layer on the dielectric layer. A second conductive layer is formed over the substrate and patterned with use of a second mask as an etching mask to form a source/drain over the substrate. A third conductive layer is formed over the substrate and patterned with use of a third mask as an etching mask to form a pixel electrode over the substrate. The pixel electrode is electrically connected to the drain.

REFERENCES:
patent: 6531330 (2003-03-01), Lay et al.
patent: 7056777 (2006-06-01), Kim et al.
patent: 7223672 (2007-05-01), Kazlas et al.
patent: 7256076 (2007-08-01), Cho et al.

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