Method for manufacturing photomask

Details Method for manufacturing photomask Method for manufacturing photomask

2007-06-28

2010-02-23

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07666556

ABSTRACT:
A method for manufacturing a photomask includes forming a mask pattern to be transferred onto a wafer on a transparent substrate; transferring the mask pattern on a wafer to form a wafer pattern; selecting a critical dimension modification region requiring a line width modification in the pattern transferred onto the wafer; forming a resist pattern for selectively exposing a portion of the substrate corresponding to the critical dimension modification region; varying a light transmittance of the exposed portion of the substrate by implanting ions into the exposed portion using the resist pattern as an ion implantation mask; and selectively removing the resist pattern.

REFERENCES:
patent: 6566016 (2003-05-01), Ziger
patent: 6777141 (2004-08-01), Pierrat
patent: 6861204 (2005-03-01), Cote et al.
patent: 2006/0019174 (2006-01-01), Ahn et al.
patent: 2006/0019176 (2006-01-01), Kim et al.
patent: 9-061990 (1997-03-01), None
patent: 10-2006-0007777 (2006-01-01), None

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