Method for manufacturing photomask

Details Method for manufacturing photomask Method for manufacturing photomask

1988-11-03

1990-09-18

Dees, Jose

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430296, 156643, G03F 100

Patent

active

049578340

ABSTRACT:
In manufacturing a photomask, a molybdenum silicide film is formed on the main surface of a quartz substrate. A resist film having a pattern is, then, formed on the molybdenum silicide film. Thereafter, the molybdenum silicide film is etched using the resist film as a mask. The etching is effected in a plasma generated in a mixed gas containing nitrogen gas in CF.sub.4 gas.

REFERENCES:
patent: 4411734 (1983-10-01), Maa

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