Method for manufacturing patterned magnetic recording medium

Details Method for manufacturing patterned magnetic recording medium Method for manufacturing patterned magnetic recording medium

2009-01-12

2011-12-06

Tran, Binh X (Department: 1713)

Etching a substrate: processes

Forming or treating article containing magnetically...

C216S039000, C216S044000

Reexamination Certificate

active

08070967

ABSTRACT:
A method for manufacturing a patterned magnetic recording medium that allows processing only required sites with high precision, in a dry etching process during formation of an uneven pattern in an interlayer. The method includes forming sequentially, on a substrate, a soft magnetic layer, an etching stop layer, a seed layer, an interlayer, a hard mask layer and a resist; obtaining a resist pattern by patterning the resist; obtaining a patterned hard mask layer by etching the hard mask layer using the resist pattern as a mask; stripping the resist pattern; obtaining a patterned interlayer by etching the interlayer using the patterned hard mask layer as a mask; stripping the patterned hard mask layer; and forming a magnetic recording layer by forming a perpendicular orientation section on the patterned interlayer, and forming a random orientation section on the seed layer.

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Notice of First Office Action dated Aug. 1, 2011 issued in corresponding Chinese patent application No. 200910000287.7, partial English Translation is provided.

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