Method for manufacturing organic monomolecular film

Details Method for manufacturing organic monomolecular film Method for manufacturing organic monomolecular film

1996-10-18

1999-08-24

Dixon, Merrick

Coating processes

With post-treatment of coating or coating material

Liquid extraction of coating constituent or cleaning coating

4274432, 427435, 4274301, 427444, 355 85, 355210, 355211, B05D 300

Patent

active

059422866

ABSTRACT:
The present invention provides a method for selectively allowing film-forming molecules to be chemically adsorbed onto an Si substrate to produce a good and robust organic monomolecular film, wherein molecules with SH groups are chemically adsorbed onto the Si substrate to form a monomolecular film of the molecules by heating an As molecular beam source 4 to allow a monoatomic layer thickness of arsenic to be adsorbed onto the clean surface of the Si substrate set on a sample stage 3 and then immersing the Si substrate terminated by arsenic in a solution containing molecules with SH groups.

REFERENCES:
patent: 5209976 (1993-05-01), Ogawa
patent: 5424098 (1995-06-01), Nislyama et al.
patent: 5445886 (1995-08-01), Ogawa
patent: 5519469 (1996-05-01), Obata

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