Semiconductor device manufacturing: process – Making passive device – Resistor
Reexamination Certificate
2011-07-19
2011-07-19
Garber, Charles D (Department: 2812)
Semiconductor device manufacturing: process
Making passive device
Resistor
C438S382000, C257SE21645
Reexamination Certificate
active
07981760
ABSTRACT:
A method for manufacturing a nonvolatile storage element that minimizes shape shift between an upper electrode and a lower electrode, and which includes: depositing, in sequence, a connecting electrode layer which is conductive, a lower electrode layer and a variable resistance layer which are made of a non-noble metal nitride and are conductive, an upper electrode layer made of noble metal, and a mask layer; forming the mask layer into a predetermined shape; forming the upper electrode layer, the variable resistance layer, and the lower electrode layer into the predetermined shape by etching using the mask layer as a mask; and removing, simultaneously, the mask and a region of the connecting electrode layer that has been exposed by the etching.
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Arita Koji
Kawashima Yoshio
Mikawa Takumi
Takagi Takeshi
Garber Charles D
Panasonic Corporation
Patel Reema
Wenderoth Lind & Ponack, LLP.
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