Method for manufacturing micro-structural unit

Details Method for manufacturing micro-structural unit Method for manufacturing micro-structural unit

2007-03-20

2007-03-20

Norton, Nadine (Department: 1765)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S050000, C438S052000, C438S053000, C438S706000

Reexamination Certificate

active

11207871

ABSTRACT:
A method for manufacturing a micro-structural unit is provided. By the method, micro-machining is performed on a material substrate including first through third conductive layers and two insulating layers, one of which is interposed between the first and the second conductive layers, and the other between the second and the third conductive layers. The method includes several etching steps performed on the layers of the material substrate that are different in thickness.

REFERENCES:
patent: 6423563 (2002-07-01), Fukada et al.
patent: 6914711 (2005-07-01), Novotny et al.
patent: 10-190007 (1998-07-01), None
patent: 10-270714 (1998-10-01), None
patent: 2000-31502 (2000-01-01), None
patent: 2003-136497 (2003-05-01), None

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