Method for manufacturing micro lenses including underlayer...

Details Method for manufacturing micro lenses including underlayer... Method for manufacturing micro lenses including underlayer...

2004-04-16

2008-12-02

Vu, David (Department: 2818)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

C257S294000

Reexamination Certificate

active

07459327

ABSTRACT:
A solid-state imager is disclosed wherein isolation regions (4) are covered with power supply lines (8), a light-transmitting lens film (24) whose surface forms continuous convex portions above the isolation regions (4) convex towards channel regions (5) is provided, and a light-transmitting material having a refractive index lower than that of the lens film (24) is provided over the lens film (24).

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U.S. Appl. No. 10/382,413.
U.S. Appl. No. 11/025,618.

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