METHOD FOR MANUFACTURING MASTER SUBSTRATE USED FOR...

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Reexamination Certificate

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Reexamination Certificate

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06874262

ABSTRACT:
A substrate having a photoresist coated thereon is exposed to exposure light along a line through a lens1. The exposure position is moved from the initial position O1to a position O2that is separated from the initial position by a distance corresponding to the sum of a groove width Gw and a land width Lw. The exposure is carried out along a line parallel to the initial exposure line. By repeating this, exposed areas having a width Lw and a separation Gw are formed on the photoresist. The photoresist is developed to remove the exposed areas of the photoresist. A resin or the like is pressed on it to form a replica. From the replica, a stamper is manufactured using an electroforming method. Finally, a grooved molding substrate is manufactured from a glass or resin using the stamper. Although the land width Lw is defined by the effective spot diameter φ of the optical system, the groove width Gw can be less than this value.

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