Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2008-03-04
2008-03-04
Bell, Bruce F. (Department: 1795)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298120, C204S192120, C204S192220, C427S070000, C427S126300, C427S255190, C427S255310, C427S419200, C427S576000, C427S584000, C427S597000, C252S500000, C252S518100, C423S599000, C423S605000, C117S088000, C117S092000, C117S103000, C117S108000
Reexamination Certificate
active
07338582
ABSTRACT:
It is an object of the present invention to provide an oxygen reduction electrode having excellent oxygen reduction catalysis ability. In a method of manufacturing a manganese oxide nanostructure having excellent oxygen reduction catalysis ability and composed of secondary particles which are aggregations of primary particles of manganese oxide, a target plate made of manganese oxide is irradiated with laser light to desorb the component substance of the target plate, and the desorbed substance is deposited on a substrate facing substantially parallel to the aforementioned target plate.
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Sasaki et al., “Preparation of Metal Oxide Nanoparticles by Laser Ablation”, Laser Review, 2000, vol. 28, No. 6, pp. 348-353.
Chinese Office Action issued in corresponding Chinese Patent Application No. CN 2004800158448, dated Dec. 8, 2006.
Sasaki et al., Shadan Hojin Laser Kenkyu, 2000, vol. 28, No. 6., pp. 348-353.
Morinaga Yasunori
Sasaki Hidehiro
Suzuki Nobuyasu
Yamada Yuka
Bell Bruce F.
Matsushita Electric - Industrial Co., Ltd.
McDermott Will & Emery LLP
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