Etching a substrate: processes – Forming or treating thermal ink jet article
Reexamination Certificate
2005-10-25
2005-10-25
Zervigon, Rudy (Department: 1763)
Etching a substrate: processes
Forming or treating thermal ink jet article
C216S041000, C216S047000, C216S046000, C216S058000, C216S083000, C216S056000, C347S047000
Reexamination Certificate
active
06958125
ABSTRACT:
A method for manufacturing a liquid jet recording head having an element substrate provided with a plurality of discharge energy generating elements for applying discharging energy to a recording liquid in accordance with image data, a liquid chamber for storing the recording liquid, and a top plate having a plurality of nozzles, is provided. The method includes a step of forming, on an anisotropic-etching mask layer provided on a nozzle surface of the top plate, compensation patterns extending to a liquid chamber region in order to form the nozzles and the liquid chamber by anisotropic etching, and a step of performing anisotropic etching of the top plate through the mask layer and forming the liquid chamber to have a substantially rectangular shape at the nozzle surface of the top plate by over-etching portions with the compensation patterns.
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