Method for manufacturing holographic recording medium and...

Radiation imagery chemistry: process – composition – or product th – Holographic process – composition – or product

Reexamination Certificate

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Details

C430S002000, C430S311000, C359S015000, C359S012000, C359S032000

Reexamination Certificate

active

08053145

ABSTRACT:
To provide a method for manufacturing a holographic recording medium and a method for manufacturing a semiconductor device, by which effects of distortion or irregularities of the surface of an exposure object can be reduced. The method includes the steps of: splitting a laser beam emitted from a laser oscillator into a first laser beam and a second laser beam, and forming a fringe pattern in a holographic recording medium by illuminating the holographic recording medium with the first laser beam through a mask and illuminating the holographic recording medium with the second laser beam. The mask is a substrate having a light-shielding film formed over its surface.

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Iriguchi et al “05. fine-gate TFT fabrication on 300 x 300 mm2 glass substrate using holographic microlithography” SID 03 Dig paper 34.3 pp. 1092-1095 (2003).
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Machine translation of JP 2004-253660 (Sep. 2004).
U.S. Appl. No. 60/728,941, filed Oct. 18, 2005.

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