Method for manufacturing fused quartz glass

Glass manufacturing – Processes – With shaping of particulate material and subsequent fusing...

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65 183, 65 66, 427 34, C03B 2000, C03B 1900

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044327811

ABSTRACT:
The invention provides a novel method for manufacturing fused quartz glass by the decomposition and oxidation of a vaporizable silicon compound such as silicon tetrachloride in a plasma flame according to which the quartz glass rod produced contains a controlled amount of hydroxy groups with high reproducibility. The principle of the inventive method consists in the admixture of gaseous hydrogen chloride into the gaseous reactant mixture or in the plasma-supporting gas as the source for the hydrogen atoms to be converted to the hydroxy groups in place of hydrogen gas or water vapor as the hydrogen source. Good proportionality is established between the concentration of the hydrogen chloride in the gaseous feed and the hydroxy content in the resultant fused quartz glass rod.

REFERENCES:
patent: 4367013 (1983-01-01), Guerder et al.

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