Method for manufacturing functional thin film

Coating processes – Magnetic base or coating – Magnetic coating

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427130, 4272481, 427250, 4272551, 427294, 427295, 427348, 427349, 427377, B05D 512

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051869772

ABSTRACT:
In a method for manufacturing a functional thin film by a vacuum evaporation method, during a thin film containing a material is evaporation-deposited on a substrate, a gas flow controls orientation of the material in a manner that the gas flow substantially intersects direction of flow of vapor of said material onto the substrate.

REFERENCES:
patent: 4146656 (1979-03-01), Kinugawa et al.
patent: 4451501 (1984-05-01), Nagao et al.
patent: 4474832 (1984-10-01), Shirahata et al.
patent: 4477489 (1984-10-01), Yanai et al.
patent: 4585689 (1986-04-01), Ohta et al.
patent: 4702938 (1987-10-01), Yasunaga et al.
patent: 4713262 (1987-12-01), Yasunga et al.
patent: 4714047 (1987-12-01), Ikeda et al.
patent: 4800105 (1989-01-01), Nakayama
patent: 4801500 (1989-01-01), Yasunaga et al.
patent: 4873154 (1989-10-01), Yasunga et al.
patent: 4885189 (1989-12-01), Yasunaga et al.

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