Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1990-07-27
1992-03-17
Chaudhuri, Olik
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
423344, C01B 33113
Patent
active
050966855
ABSTRACT:
A system for manufacturing fine-grained SiO powder includes means for heating a mixture of an SiO.sub.2 containing material and an Si and/or C containing material for generating SiO vapor, and for condensing the generated SiO vapor from a gaseous state in the presence of non-oxidizing gas and under substantially low pressure. Preferably, vacuum is maintained at the position where thermal reaction generates SiO vapor. Non-oxidizing gas serves for transferring vapor-state SiO and/or fine-grained SiO powder to an SiO collection chamber. This successfully prevents the SiO from being accumulated within a transfer pipe or duct and thus prevents the pipe or duct from being blocked. Furthermore, substantially low pressure (vacuum) atmosphere encourages SiO vapor generation from the reagent mixture and thus permits a lower heating temperature to cause SiO vapor generation.
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Hackh's Chemical Dictionary, Grant, 1986, pp. 736, 440 and 725.
Funahashi Toshihiko
Oguchi Yukio
Uchimura Ryoji
Ueda Ken-ichi
Chaudhuri Olik
Horton Ken
Kawasaki Steel Corporation
Miller Austin R.
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