Semiconductor device manufacturing: process – Having magnetic or ferroelectric component
Reexamination Certificate
2007-07-23
2009-06-30
Nhu, David (Department: 2895)
Semiconductor device manufacturing: process
Having magnetic or ferroelectric component
C438S680000, C438S692000, C257SE21170, C257SE21267, C257SE21304, C257SE21645
Reexamination Certificate
active
07553677
ABSTRACT:
A method for manufacturing a ferroelectric memory includes the steps of: (a) forming a ferroelectric capacitor by sequentially laminating, on a substrate, a lower electrode, a ferroelectric layer and an upper electrode; (b) forming a first dielectric layer that covers the ferroelectric capacitor; (c) forming a contact hole in the first dielectric layer to expose the upper electrode; (d) heating the substrate to 350° C. or higher; and (e) forming a conductive layer inside the contact hole.
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Kitahara Yukio
Sawasaki Tatsuo
Harness & Dickey & Pierce P.L.C.
Nhu David
Seiko Epson Corporation
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