Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate
2007-09-11
2007-09-11
Goudreau, George A. (Department: 1763)
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
C134S001300, C438S704000, C438S705000, C438S720000, C438S725000, C438S734000, C438S749000
Reexamination Certificate
active
11222749
ABSTRACT:
A method for manufacturing an electronic device comprising the steps of: dry-etching a Ti-containing metal film formed on a substrate with a gas containing fluorine; and treating the substrate with a chemical solution containing fluorine ions after the dry etching step.
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Wada Yukihisa
Watanabe Masayuki
Goudreau George A.
Matsushita Electric Inductrial Co., Ltd.
McDermott Will & Emery LLP
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