Method for manufacturing electronic device

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...

Reexamination Certificate

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Details

C134S001300, C438S704000, C438S705000, C438S720000, C438S725000, C438S734000, C438S749000

Reexamination Certificate

active

11222749

ABSTRACT:
A method for manufacturing an electronic device comprising the steps of: dry-etching a Ti-containing metal film formed on a substrate with a gas containing fluorine; and treating the substrate with a chemical solution containing fluorine ions after the dry etching step.

REFERENCES:
patent: 5730834 (1998-03-01), Gabriel
patent: 5804505 (1998-09-01), Yamada et al.
patent: 6143658 (2000-11-01), Donnelly et al.
patent: 2003/0219912 (2003-11-01), Chen et al.
patent: 06-151383 (1994-05-01), None
patent: 11-111688 (1999-04-01), None
patent: 11-274127 (1999-10-01), None
patent: 2000-232096 (2000-08-01), None

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