Etching a substrate: processes – Forming or treating optical article
Reexamination Certificate
2007-02-27
2007-02-27
Norton, Napine (Department: 1765)
Etching a substrate: processes
Forming or treating optical article
C216S023000, C216S025000, C216S026000
Reexamination Certificate
active
10732198
ABSTRACT:
A method is provided for manufacturing an electro-optical device, in which fine scratches or cracks can be removed by etching without damaging wiring, an electro-optical device, and an electronic apparatus. According to the method, a liquid crystal panel used in an electro-optical device is cut as a single product. Then, before an IC mounting step, in a state of the single product liquid crystal panel, a wet etching is performed on the cut faces and edges of the first and second substrates to remove fine scratches or cracks from the cut faces and edges of the substrates. At this time, wiring portions, IC mounting terminals, substrate mounting terminals, and alignment marks, which are formed on the protruding region, are covered with a protection layer.
REFERENCES:
patent: 5770305 (1998-06-01), Terasaka
patent: 5909264 (1999-06-01), Fujikawa et al.
patent: 6613148 (2003-09-01), Rasmussen
patent: 6613606 (2003-09-01), Lee
patent: 6667222 (2003-12-01), Su et al.
patent: 2002/0167634 (2002-11-01), Watanable et al.
patent: 2003/0057183 (2003-03-01), Cho et al.
patent: 2003/0132523 (2003-07-01), Ohtani et al.
patent: 2003/0146491 (2003-08-01), Tsuura
patent: 2312073 (1997-10-01), None
patent: 06-206740 (1994-07-01), None
patent: 08-262419 (1996-10-01), None
patent: 08-328485 (1996-12-01), None
patent: 10-010505 (1998-01-01), None
patent: 10-133186 (1998-05-01), None
patent: 10-206898 (1998-08-01), None
patent: 10-231144 (1998-09-01), None
patent: 2000-172189 (2000-06-01), None
patent: 2000-321591 (2000-11-01), None
patent: 2001-075117 (2001-03-01), None
patent: 2001-091918 (2001-04-01), None
patent: 2001-125508 (2001-05-01), None
patent: 2001320196 (2001-11-01), None
patent: 2002-049026 (2002-02-01), None
patent: 2002-196361 (2002-07-01), None
patent: 2002-318547 (2002-10-01), None
patent: 2003-084265 (2003-03-01), None
patent: 10-0202231 (1999-03-01), None
Communication from Japanese Patent Office re: counterpart application, no date.
Communication from Chinese Patent Office re: related application, no date.
Communication from Korean Patent Office regarding related application, no date.
Hanakawa Manabu
Murai Hidetoshi
George Patricia A.
Harness & Dickey & Pierce P.L.C.
Norton Napine
Seiko Epson Corporation
LandOfFree
Method for manufacturing electro-optical device,... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for manufacturing electro-optical device,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for manufacturing electro-optical device,... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3821462