Method for manufacturing display substrate

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Having substrate registration feature

Reexamination Certificate

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Details

C257SE21525, C349S123000, C349S129000

Reexamination Certificate

active

07544581

ABSTRACT:
A method for manufacturing a display substrate is disclosed, which includes the following steps: providing a substrate; forming a plurality of bumps on an active area of the substrate and at least one marking pattern on a non-active area of the substrate; and staining the marking pattern or filling a material having low transmittance ratio into the marking pattern. The present invention further discloses a method for making a display substrate, including the steps: providing a substrate; forming a shadow layer on a non-active area of the substrate; forming a plurality of bumps on an active area of the substrate and at least one marking pattern on the shadow layer of the non-active area on the substrate; and removing a part of the shadow layer not covered by the marking pattern.

REFERENCES:
patent: 2006/0098151 (2006-05-01), Inoue et al.
patent: 2007/0103629 (2007-05-01), Li
patent: 2007/0153213 (2007-07-01), Huang et al.
patent: 2008/0088774 (2008-04-01), Fan Jiang et al.

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