Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2007-07-25
2010-10-05
Picardat, Kevin M (Department: 2822)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C438S030000, C438S642000
Reexamination Certificate
active
07807483
ABSTRACT:
An object is to provide a display device that can be manufactured by improvement of use efficiency of a material and simplification of a manufacturing process. A light absorbing layer is formed, an insulating layer is formed over the light absorbing layer, the light absorbing layer and the insulating layer are selectively irradiated with laser light, an irradiated region in the insulating layer is removed to form an opening in the insulating layer, and a conductive film is formed in the opening so as to be in contact with the light absorbing layer. The conductive film is formed in the opening so as to be in contact with the light absorbing layer, which is exposed, so that the light absorbing layer and the conductive layer can be electrically connected with the insulating layer interposed therebetween.
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Office Action re Chinese application No. CN 200710137129.7, dated Mar. 5, 2010 (with English translation).
Oishi Hirotada
Shoji Hironobu
Tanaka Koichiro
Yamazaki Shunpei
Husch Blackwell Sanders LLP
Picardat Kevin M
Semiconductor Energy Laboratory Co,. Ltd.
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