Method for manufacturing display device

Details Method for manufacturing display device Method for manufacturing display device

2011-08-23

2011-08-23

Chaudhari, Chandra (Department: 2891)

Stock material or miscellaneous articles

Structurally defined web or sheet

Including variation in thickness

C257SE21412

Reexamination Certificate

active

08003195

ABSTRACT:
A method for manufacturing a display device includes forming an active layer by performing an SPC (solid phase crystallization) process on a first substrate; forming a cushioning layer of amorphous silicon (a-Si) on the active layer under an atmosphere containing about 90 to about 97% by flow rate of hydrogen (H2) and about 10 to about 3% by flow rate of silane (SiH4); forming an N-type impurity layer on the cushioning layer; forming a metal layer to cover the N-type impurity layer; forming a source and drain by removing the metal film by a first etching method; and separating the N-type impurity layer and the cushioning layer by a second etching method.

REFERENCES:
patent: 5982471 (1999-11-01), Hirakata et al.
patent: 6197625 (2001-03-01), Choi
patent: 2006/0024866 (2006-02-01), Gan et al.
Office Action issued in corresponding Chinese Patent Application No. 200810189431.1; issued Jul. 13, 2010.

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