Coating processes – Electrical product produced
Reexamination Certificate
2007-06-27
2011-11-01
Lin, James (Department: 1715)
Coating processes
Electrical product produced
C427S271000, C427S421100, C216S013000, C216S042000, C216S047000
Reexamination Certificate
active
08048473
ABSTRACT:
When a mask layer is formed, a first liquid composition containing a mask-layer-forming material is applied on an outer side of a pattern that is desired to be formed (corresponding to a contour or an edge portion of a pattern) to form a first mask layer having a frame shape. A second liquid composition containing a mask-layer-forming material is applied so as to fill a space inside the first mask layer having a frame shape to form a second mask layer. The first mask layer and the second mask layer are formed to be in contact with each other, and the first mask layer is formed to surround the second mask layer. Therefore, the first mask layer and the second mask layer can be used as one continuous mask layer.
REFERENCES:
patent: 2001/0006408 (2001-07-01), Matsuyama et al.
patent: 2006/0040435 (2006-02-01), Morisue et al.
patent: 2007/0145002 (2007-06-01), Street
patent: 2000-133636 (2000-05-01), None
Kawamata Ikuko
Shoji Hironobu
Yamazaki Shunpei
Husch & Blackwell LLP
Lin James
Semiconductor Energy Laboratory Co,. Ltd.
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