Radiation imagery chemistry: process – composition – or product th – Post imaging processing – Physical developing
Patent
1986-07-07
1989-05-02
Arnold, Bruce Y.
Radiation imagery chemistry: process, composition, or product th
Post imaging processing
Physical developing
350 37, 3501622, 430299, G02B 518, G02B 532
Patent
active
048262919
ABSTRACT:
A method is disclosed for manufacturing a diffraction grating formed by corrugations reversed in phase between a first region and a second region through use of two kinds of photoresists of opposite photosensitive characteristics. An isolation film is introduced for preventing the photoresists from getting mixed with each other, permitting the combined use of any photoresists. A step may be further included in which the isolation film is deposited on one of two kinds of photoresist films in at least one of a first region and a second region, is subjected to two-beam interference exposure, is removed and then a degraded layer, which is formed in the surface of the above said one kind of photoresist film during the deposition of the isolation film, is removed.
REFERENCES:
patent: 4660934 (1987-04-01), Akiba et al.
Akiba Shigeyuki
Matsushima Yuichi
Utaka Katsuyuki
Arnold Bruce Y.
Burns Robert E.
Kokusai Denshin Denwa Kabushiki Kaisha
Lobato Emmanuel J.
LandOfFree
Method for manufacturing diffraction grating does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for manufacturing diffraction grating, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for manufacturing diffraction grating will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-581100