Coating processes – Coating by vapor – gas – or smoke – Carbon or carbide coating
Reexamination Certificate
2006-10-10
2006-10-10
Chen, Bret (Department: 1762)
Coating processes
Coating by vapor, gas, or smoke
Carbon or carbide coating
C427S249110
Reexamination Certificate
active
07118782
ABSTRACT:
A method of manufacturing diamond coatings, at low temperature and low pressure on a substrate utilizing chemical vapor transport (CVT) comprising the steps of: providing a wire-wrapped graphite assembly component and the substrate into a chamber; filling the chamber with hydrogen; reducing ambient pressure in the chamber to a vacuum and backfilling with hydrogen; sealing the chamber containing hydrogen at a pressure less than 1 atmosphere; and passing electric current through the graphite rod until the substrate is heated within a range of 125° C.–750° C. to produce high-quality diamond at temperatures with exceptional properties.
REFERENCES:
patent: 4259090 (1981-03-01), Bovenkerk
patent: 4425315 (1984-01-01), Tsuji et al.
patent: 4525179 (1985-06-01), Gigl
patent: 5340401 (1994-08-01), Cann
patent: 5587207 (1996-12-01), Gorokhovsky
patent: 5863324 (1999-01-01), Kobashi et al.
patent: 5871805 (1999-02-01), Lemelson
patent: 5920080 (1999-07-01), Jones
patent: 6042900 (2000-03-01), Rakhimov et al.
patent: 6045877 (2000-04-01), Gleason et al.
patent: 6198218 (2001-03-01), Kobashi et al.
patent: 6214706 (2001-04-01), Madan et al.
patent: 6525335 (2003-02-01), Krames et al.
patent: 6560398 (2003-05-01), Roach et al.
patent: 6608449 (2003-08-01), Fukunaga
patent: 6882094 (2005-04-01), Dimitrijevic et al.
patent: 2003/0108672 (2003-06-01), Takagi
patent: 2003/0173895 (2003-09-01), Kato et al.
patent: 2004/0194689 (2004-10-01), Sung
patent: 08 225394 (1996-09-01), None
patent: WO200181660 (2001-11-01), None
A. Gicquel, K. Hassouni, F. Silva and J. Achard, “CVD diamond films: from growth to applications,”Current Applied Physics1 (2001), pp. 479-496.
“Diamond Films” Recent Developments, vol. 23, No. 9 of the MRS Bulletin (Sep. 1998), Materials Research Society, Warrendale, Pennsylvania.
L.L. Regel and W.R. Wilcox, “Diamond film deposition by chemical vapor transport,”Acta Astronautica48 (2001), pp. 129-144.
W.L. Wang, K.J. Liao, R.Q. Zhang and C.Y. Kong, “Investigation of organic light emitting devices using boron-doped diamond electrodes,” Materials Science and Engineering B85 (2001), pp. 169-171.
M.J. Ulczynski, B. Wright and D.K. Reinhard, “Diamond-coated glass substrates,”Diamond and Related Materials7 (1998), pp. 1639-1646.
J. Stiegler, A. Bergmaier, J. Michler, Y. von Kaenel, G. Dollinger, E. Blank, “Impurity and defect incorporation in diamond films deposited at low substrate temperatures,”Diamond and Related Materials7 (1998), pp. 193-199.
C. Jinsheng, W. Xuejun, Z. Zhihao and Y. Fengyuan, “Nucleation and growth of diamond on silicon substrate coated with polymer,”Thin Solid Films346 (1999), pp. 120-124.
Z. Sun, X. Shi, X. Wang, B.K. Tay, H. Yang and Y. Sun, “Morphological features of diamond films depending on substrate temperatures via a low pressure polymer precursor process in a hot filament reactor,”Diamond and Related Materials7 (1998), pp. 939-943.
V.J. Trava-Airoldi, B.N. Nobrega, E.J. Corat, E. del Bosco, N.F. Leiter and V. Baranauskas, “Low temperature chemical vapour deposition of diamond on tungsten carbides using CF4gas doping for machine tool applications”,Vacuum46 (1995) 5-8.
L. Dong, B. Ma and G. Dong, “Diamond deposition at low temperature by using CH4/H2gas mixture,”Diamond and Related Materials11 (2002), pp. 1697-1702.
J. Petherbridge, P.W. May, S.R.J. Pearce, K.N. Rosser and M.N. Ashfold, “Molecular beam mass spectrometry investigations of low temperature diamond growth using CO2/CH4plasmas,”Diamond and Related Materials10 (2001), pp. 393-398.
I. Schmidt and C. Benndorf, “Low temperature CVD materials: AlZn and glass,”Diamond and Related Materials10 (2001), pp. 347-351.
A. Li Tolt, L. Heatherly, R.E. Clausing, R.W. Shaw and C.S. Feigerle, “HFCD of diamond at low substrate and low filament temperatures,” pp. 303-311 inElectrochemical Society Proceedingsvol. 95-4,Proceedings of the Fourth International Symposium on Diamond Materials,edited by K.V. Ravi and J.P. Dismukes, The Electrochemical Society, Pennington, NJ (1995).
A. Hatta and A. Hiraki, “Low temperature chemical vapor deposition,” pp. 887-899, inHandbook of Industrial Diamonds and Diamond Films,edited by M.A. Prelas, G. Popovici and L.K. Bigelow, Marcel Dekker, NY (1998).
J.G. Buijnster, P. Shankar, W.J.P. van Enckevort, J.J. Schermer and J.J ter Meulen, “The effect of nitriding on the diamond film characteristics on chromium substrates,”Diamond and Related Materials11 (2002), pp. 1760-1768.
B.V. Spitsyn, “The state of the art in studies of diamond synthesis from the gaseous phase and some unsolved problems,” inApplications of Diamond Films and Related Materials,edited by Y. Tzeng, M. Yoshikawa, M. Murakami and A. Feldman. Elsevier, Amsterdam (1991), no page numbers.
B.V. Spitsyn, “Crystallization of diamond by the chemical transport reaction: thermodynamics and kinetics,” pp. 61-72, inElectrochemical Society Proceedingsvol. 95-4,Proceedings of the Fourth International Symposium on Diamond Materials,edited by K.V. Ravi and J.P. Dismukes, The Electrochemical Society, Pennington, NJ (1995).
L.L. Regel, T. Takagi and W.R. Wilcox, “Centrifugal diamond film processing,” pp. 221-227, inCentrifugal Materials Processing,edited by L.L. Regel and W.R. Wilcox, Plenum Press, NY (1997).
H.K. Woo, C.S. Lee, I. Bello. St. T. Lee, K.W. Wong and N.B. Wong, “Oriented diamond growth on silicon (111) using a solid carbon source,”J. Applied Physics83 (1998), pp. 4187-4192.
S.D. Shin, N.M. Hwang and D.Y. Kim, “High rate of diamond deposition through graphite etching in a hot filament CVD reactor,”Diamond and Related Materials11 (2002), pp. 1337-1343.
L.L. Regel and W.R. Wilcox, “Selective patterned deposition of diamond using a new technique,”J. Mat. Sci. Lettr.18 (1999), pp. 427-430.
Y. Takagi, L.L. Regel and W.R. Wilcox, “New method for diamond film deposition under different gravity conditions,”Trans. Mat. Res. Soc. Japan24 (1999), pp. 513-518.
L.L. Regel and W.R. Wilcox, “Deposition of diamond on graphite and carbon felt from graphite heated in hydrogen at low pressure,”J. Mat. Sci. Lettr.19 (2000), pp. 455-457.
Cropper Andre D.
Regel Liya
Chen Bret
Eastman Kodak Company
Shaw Stephen H.
LandOfFree
Method for manufacturing diamond coatings does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for manufacturing diamond coatings, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for manufacturing diamond coatings will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3651073