Method for manufacturing CPP-type magnetoresistance effect...

Details Method for manufacturing CPP-type magnetoresistance effect... Method for manufacturing CPP-type magnetoresistance effect...

2011-05-24

2011-05-24

Tran, Binh X (Department: 1713)

Etching a substrate: processes

Forming or treating article containing magnetically...

C216S075000, C216S077000, C216S078000, C216S100000, C216S102000

Reexamination Certificate

active

07947188

ABSTRACT:
A method for manufacturing a thin film magnetic head includes a step for forming an MR layered body; a step for forming a first sacrificial layer made of material removable by wet etching, and subsequently, forming a cap layer on the upper surface of the first sacrificial layer; further, a step for patterning the MR layered body and the cap layer and then filling part of the removed areas of the MR layered body and the cap layer with a bias magnetic layer and the remaining with insulating layers; a step for removing the cap layer by dry etching and, subsequently, removing the first sacrificial layer by wet etching; and a step for forming a second shield layer above the MR layered body and the bias magnetic layer.

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